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Role of the Plasma Activation Degree on Densification of Organosilicon Films

Rita C. C. Rangel;Nilson C. Cruz;Elidiane C. Rangel;Rangel, Rita C. C.;Cruz, Nilson C.;Rangel,...

2019 Materials (Basel, Switzerland) DOI: 10.3390/ma13010025 124 views

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PECVD sioxcyhz densification organosilicon corrosion barrier