Role of the Plasma Activation Degree on Densification of Organosilicon Films

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ID: 271418
2019
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Abstract
The possibility of controlling the density of organosilicon films was investigated by tuning the plasma activation degree without providing extra energy to the structure, as usually reported in the literature. For this purpose, thin films were deposited in plasmas fed with hexamethyldisiloxane/Ar mi …
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Authors Rangel RCC;Cruz NC;Rangel EC;;
Journal Materials (Basel, Switzerland)
Year 2019
DOI
DOI not found
URL
https://www.ncbi.nlm.nih.gov/sites/entrez/31861607
Keywords
National Center for Biotechnology Information NCBI NLM MEDLINE pubmed abstract nih national institutes of health national library of medicine pmid:31861607 pmc6981977 doi:10.3390/ma13010025 rita c c rangel nilson c cruz elidiane c rangel

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