Role of the Plasma Activation Degree on Densification of Organosilicon Films
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ID: 271418
2019
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Abstract
The possibility of controlling the density of organosilicon films was investigated by tuning the plasma activation degree without providing extra energy to the structure, as usually reported in the literature. For this purpose, thin films were deposited in plasmas fed with hexamethyldisiloxane/Ar mi …
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| Reference Key |
rcc2019materialsrole
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|---|---|
| Authors | Rangel RCC;Cruz NC;Rangel EC;; |
| Journal | Materials (Basel, Switzerland) |
| Year | 2019 |
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