preparación de recubrimientos cerámicos mediante técnicas de cvd
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ID: 223917
1998
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Abstract
The fundamentals of the Chemical Vapour Deposition (CVD) techniques and the key parameters determining the characteristics of the deposited layers are described. In addition, we discuss the different activation methods of the precursor gases which are necessary to achieve high reaction rates, and give some practical examples of CVD techniques applied to the preparation of ceramic coatings.<br><br>Se describen los fundamentos de la técnica de CVD y los principales parámetros que determinan las características de las capas depositadas. Se discuten así mismo los diferentes métodos de activación de los gases precursores, necesarios para que la reacción de deposición ocurra con velocidades apreciables y se dan algunos ejemplos de aplicación de las técnicas de CVD en la preparación de recubrimientos cerámicos.
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|---|---|
| Authors | ;Ojeda, F.;Marti, F. J.;Albella, J. M. |
| Journal | medicinal chemistry (shariqah (united arab emirates)) |
| Year | 1998 |
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