silicon electrodeposition from chloride-fluoride melts containing k2sif6 and sio2

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ID: 149231
2017
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Abstract
Silicon electrodeposition on glassy carbon from the KF-KCl-K2SiF6, KF-KCl-K2SiF6-KOH and KF-KCl-K2SiF6-SiO2 melts was studied by the cyclic voltammetry. Тhe electroreduction of Si(IV) to metallic Si was observed as a single 4-electron wave under all considered conditions. The reactions of cathode reduction of silicon from fluoride and oxyfluoride complexes were suggested. It was shown that the process can be controlled by the preliminary transformation of SiO44- to SiF62- and SiOxFyz-. The influence of the current density on structure and morphology of silicon deposits obtained during galvanostatic electrolysis of the KF-KCl-K2SiF6-SiO2 melt was studied.
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Authors ;Zhuk Sergey I.;Isaev Vladimir A.;Grishenkova Olga V.;Isakov Andrey V.;Apisarov Alexey P.;Zaykov Yurii P.
Journal meditsinskaia radiologiia
Year 2017
DOI
10.2298/JSC160712109Z
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