critical relative indentation depth in carbon based thin films
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ID: 135319
2014
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Abstract
The thin film hardness estimation by nanoindentation is influenced by substrate beyond a critical relative indentation depth (CRID). In this study we developed a methodology to identify the CRID in amorphous carbon film. Three types of amorphous carbon film deposited on silicon have been studied. The nanoindentation tests were carried out applying a 0.1–10 mN load range on a Berkovich diamond tip, leading to penetration depth-to-film thickness ratios of 8–100%. The work regained during unloading (We) and the work performed during loading (Wt) was estimated for each indentation. The trend of unload-to-load ratio (We/Wt) data as a function of depth has been studied. We/Wt depth profiles showed a sigmoid trend and the data were fitted by means of a Hill sigmoid equation. Using Hill sigmoid fit and a simple analytical method it is possible to estimate CRID of carbon based films.
| Reference Key |
bartali2014progresscritical
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|---|---|
| Authors | ;Ruben Bartali;Alessandro Vaccari;Victor Micheli;Gloria Gottardi;Rajesh Pandiyan;Amos Collini;Paolo Lori;Gianni Coser;Nadhira Laidani |
| Journal | acta paediatrica scandinavica |
| Year | 2014 |
| DOI |
10.1016/j.pnsc.2014.05.002
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