Influence of the Plasma Regime on the Structural, Optical, Electrical and Morphological Properties of a-Si:H Thin Films

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ID: 119698
2001
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Authors Hugo Águas,Rodrigo Martins,Yuri Nunes,Manuel J.P. Maneira,Elvira Fortunato;Hugo Águas;Rodrigo Martins;Yuri Nunes;Manuel J.P. Maneira;Elvira Fortunato;
Journal materials science forum
Year 2001
DOI
10.4028/www.scientific.net/msf.382.11
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