Influence of the Plasma Regime on the Structural, Optical, Electrical and Morphological Properties of a-Si:H Thin Films

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ID: 112595
2001
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Authors Águas, Hugo;Martins, Rodrigo;Nunes, Yuri;Maneira, Manuel J.P.;Fortunato, Elvira;
Journal materials science forum
Year 2001
DOI
DOI not found
URL
https://doi.org/10.4028/www.scientific.net/msf.382.11
Keywords
Material ion bombardment langmuir probe plasma process regimes thin films optical plasma regime morphological properties

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