mixed precursor

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Zirconium-Aluminum-Oxide Dielectric Layer with High Dielectric and Relatively Low Leakage Prepared by Spin-Coating and the Application in Thin-Film Transistor
Zhihao Liang;Shangxiong Zhou;Wei Cai;Xiao Fu;Honglong Ning;Junlong Chen;Weijian Yuan;Zhennan Zhu;Rih...
2020 coatings DOI: 10.3390/coatings1003... 126 views

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