Thermoelectric Properties of Thin Films of Germanium-Gold Alloy Obtained by Magnetron Sputtering

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ID: 94728
2019
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Abstract
In this paper, the electric and thermoelectric properties of thin films of germanium⁻gold alloy (Ge⁻Au) are discussed in terms of choosing the optimal deposition process and post-processing conditions to obtain Ge⁻Au layers with the best thermoelectric parameters. Thin films were fabricated by magnetron sputtering using the Ge⁻Au alloy target onto glass substrates at two various conditions; during one of the sputtering processes, the external substrate bias voltage (Ub = −150 V) was used. After deposition thin films were annealed in the atmosphere of N2 at various temperatures (473, 523 and 573 K) to investigate the influence of annealing temperature on the electric and thermoelectric properties of films. Afterwards, the thermocouples were created by deposition of the NiCrSi/Ag contact pads onto Ge⁻Au films. In this work, particular attention has been paid to thermoelectric properties of fabricated thin films—the thermoelectric voltage, Seebeck coefficient, power factor PF and dimensionless figure of merit ZT were determined.
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nowak2019thermoelectriccoatings Use this key to autocite in the manuscript while using SciMatic Manuscript Manager or Thesis Manager
Authors Nowak, Damian;Turkiewicz, Marta;Solnica, Natalia;
Journal coatings
Year 2019
DOI
DOI not found
URL
https://www.mdpi.com/2079-6412/9/2/120
Keywords
chemistry Organic Chemistry Materials of engineering and construction. Mechanics of materials Technology (General) Chemical technology Engineering (General). Civil engineering (General) Science (General) mathematics

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