Integration of Sr0.8Bi2.2Ta2O9/HfO2 ferroelectric/dielectric composite film on Si substrate for nonvolatile memory applications

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ID: 92596
2019
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Abstract
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Reference Key
jha2019integrationferroelectrics Use this key to autocite in the manuscript while using SciMatic Manuscript Manager or Thesis Manager
Authors Jha, R.
Journal ferroelectrics, letters section
Year 2019
DOI
10.1080/07315171.2019.1668682
URL
Keywords Keywords not found

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