Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection

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ID: 89118
2018
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Abstract
Application of micro-Raman spectroscopy for the monitoring of quality of high-k (h-k) dielectric protective layer deposition onto the surface of a nanowire (NW) chip has been demonstrated. A NW chip based on silicon-on-insulator (SOI) structures, protected with a layer of high-k dielectric ((h-k)-SOI-NW chip), has been employed for highly sensitive detection of microRNA (miRNA) associated with oncological diseases. The protective dielectric included a 2-nm-thick Al2O3 surface layer and a 8-nm-thick HfO2 layer, deposited onto a silicon SOI-NW chip. Such a chip had increased time stability upon operation in solution, as compared with an unprotected SOI-NW chip with native oxide. The (h-k)-SOI-NW biosensor has been employed for the detection of DNA oligonucleotide (oDNA), which is a synthetic analogue of miRNA-21 associated with oncological diseases. To provide biospecificity of the detection, the surface of (h-k)-SOI-NW chip was modified with oligonucleotide probe molecules (oDVA probes) complementary to the sequence of the target biomolecule. Concentration sensitivity of the (h-k)-SOI-NW biosensor at the level of DL~10−16 M has been demonstrated.
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malsagova2018microramanbiosensors Use this key to autocite in the manuscript while using SciMatic Manuscript Manager or Thesis Manager
Authors Kristina A. Malsagova, Tatyana O. Pleshakova, Andrey F. Kozlov, Ivan D. Shumov, Mikhail A. Ilnitskii, Andrew V. Miakonkikh, Vladimir P. Popov, Konstantin V. Rudenko, Alexander V. Glukhov, Igor N. Kupriyanov, Nina D. Ivanova, Alexander E. Rogozhin, Alexander I. Archakov, Yuri D. Ivanov
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Journal Biosensors
Year 2018
DOI
DOI not found
URL
http://www.mdpi.com/2079-6374/8/3/72
Keywords
Biology (General) Biotechnology agriculture

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