Simulation of SiO2 and Si feature etching for microelectronics and microelectromechanical systems fabrication: A combined simulator coupling modules of surface etching, local flux calculation, and profile evolution

Clicks: 252
ID: 66536
2004
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Ranked #2 of 2 articles by views in journal of vacuum science and technology a: vacuum, surfaces and films

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Reference Key
kokkoris2004simulationjournal Use this key to autocite in the manuscript while using SciMatic Manuscript Manager or Thesis Manager
Authors Kokkoris, G.
Journal journal of vacuum science and technology a: vacuum, surfaces and films
Year 2004
DOI
10.1116/1.1738660
URL
Keywords Keywords not found

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