Assessment of titanium metallization thin film deposited on alumina substrate: Microstructure and nano-indentation.

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ID: 50375
2018
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Abstract
Surface titanium (Ti) metallization was conducted on alumina (AlO) through chemical vapor deposition (CVD) method derived from non-contact pack cementation. The effects of different deposition temperature (1000 °C, 1050 °C, and 1100 °C) were examined in this scenario. The morphology, phase composition, and interfacial defects of the resulting films were systematically investigated through scanning electron microscopy, energy dispersive spectrometry, and X-ray diffraction. The nanomechanical characterization of the proposed thin films was evaluated by conducting nano-indentation tests at different depths. The results revealed that uniform Ti films were coated on the AlO substrate. During coating, the atoms on the matrix surface were driven to form different structure due to different deposition temperature, leading to disparate morphologies of the surface and the interface, which consequently influenced the binding force between the film and the substrate. Moreover, the nanomechanical properties were found to be related to the internal and interface structure. Decreased modulus and hardness were obtained for metallization films treated at 1050 °C, and plastic deformation was the main deformation pattern.
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xing2018assessmentjournal Use this key to autocite in the manuscript while using SciMatic Manuscript Manager or Thesis Manager
Authors Xing, Xuegang;Wang, Hefeng;Xiao, Gesheng;Yang, Shangyu;Shu, Xuefeng;
Journal Journal of the mechanical behavior of biomedical materials
Year 2018
DOI
S1751-6161(18)30053-5
URL
Keywords
interface temperature microstructure alumina nano-indentation ti metallization

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