Numerical simulation research of catenary tip-insulator-metal structure for nano-lithography.

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ID: 46801
2019
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Abstract
Catenary optics has attracted much interest due to its unique properties in wave-front manipulation, field enhancement, and dispersion engineering. In this paper, the applications of catenary optics in the near-field lithography are studied. The catenary shaped nanostructures and tip-insulator-metal (TIM) structures are simultaneously utilized to increase the contrast ratio of the focal plane and to give rise to a sharp focusing focal spot with high intensity. Moreover, the full width at half-maximum of the focal spot maintains well below the diffraction limit. The proposed catenary TIM structure may improve the quality of near-field lithography and find applications in super-resolution near-field direct writing nano-lithography.
Reference Key
zhang2019numericalapplied Use this key to autocite in the manuscript while using SciMatic Manuscript Manager or Thesis Manager
Authors Zhang, Wen-Peng;Liang, Fei;Long, Xi-Yu;Liu, Zheng-Qiang;Su, Ya-Rong;Liu, Ke;Chen, Wei-Dong;Xie, Zheng-Wei;Li, Ling;
Journal Applied optics
Year 2019
DOI
10.1364/AO.58.005159
URL
Keywords
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