Chemically induced Fermi level pinning effects of high-k dielectrics on graphene

Clicks: 431
ID: 44506
2018
Free PDF
Article Quality & Performance Metrics
Overall Quality Improving Quality
0.0 /100
Combines engagement data with AI-assessed academic quality
AI Quality Assessment
Not analyzed
Abstract
Abstract High-k materials such as Al2O3 and HfO2 are widely used as gate dielectrics in graphene devices. However, the effective work function values of metal gate in graphene FET are significantly deviated from their vacuum work function, which is similar to the Fermi level pinning effect observed in silicon MOSFETs with high-k dielectric. The degree of deviation represented by a pinning factor was much worse with HfO2 (pinning factor (S) = 0.19) than with Al2O3 (S = 0.69). We propose that the significant pinning-like behaviors induced by HfO2 are correlated with the oxygen exchange reactions occurred at the interface of graphene and HfO2.
Reference Key
kim2018chemicallyscientific Use this key to autocite in the manuscript while using SciMatic Manuscript Manager or Thesis Manager
Authors Kim, So-Young;Kim, Yun Ji;Jung, Ukjin;Lee, Byoung Hun;
Journal Scientific reports
Year 2018
DOI
DOI not found
URL
http://link.springer.com/article/10.1038/s41598-018-21055-z
Keywords
chemistry microscopy Medicine Engineering (General). Civil engineering (General) Technology Electrical engineering. Electronics. Nuclear engineering Descriptive and experimental mechanics Science physics electronics

Citations

No citations found. To add a citation, contact the admin at info@scimatic.org

Comments

No comments yet. Be the first to comment on this article.