A study on the electrophoretic deposition of gadolinium doped ceria on polypyrrole coated yttrium stabilized zirconia.

Clicks: 246
ID: 37643
2019
Article Quality & Performance Metrics
Overall Quality
Not rated
Combines reader engagement with the AI quality analysis. This article has not been analysed, so there is no overall score — reader engagement is measured and shown alongside.
AI Quality Assessment
Not analyzed
Readership in this journal
Steady

Ranked #83 of 128 articles by views in Journal of colloid and interface science

Most read Least read

Bar heights use a square-root scale. Only the 120 most-read articles are drawn; the journal has 128 in total.

Mint this article as an NFT
Not yet minted

Create a permanent, verifiable on-chain record of this article on the Scimatic Network. The NFT is held in your Journament account, and you can withdraw it to your own wallet at any time.

5 SUSD one-off · no wallet required
Abstract
The technological feasibility of electrophoretic deposition (EPD) of gadolinium doped ceria (GDC) on polypyrrole (PPy) coated yttrium stabilized zirconia (YSZ) has been reported. To enhance the EPD technique for the fabrication of GDC layer and to deepen the understanding of EPD, the fundamental characteristics of EPD of GDC on PPy coated YSZ were investigated. The deposition rate of GDC on PPy coated YSZ is slower than that on graphite under the same voltage. An H ion accumulation zone is formed in the vicinity of PPy coated YSZ after applying the voltage. The thickness of this ion accumulation zone initially increases and then decreases. Finally, the ion accumulation zone is replaced by an ion depletion zone. The absorbed H ions are desorbed from the particles after deposition and are then reduced to hydrogen gas. The reduction of absorbed H ions and free H ions corresponds to the deposition and the unavoidable side reaction, respectively. A new parameter, f, the percentage of electric charged associated with the reduction of absorbed H ions in the total charge, is introduced to reflect the competitive relationship between the deposition and the inevitable side reaction. f decreases with the increase of current density.
Reference Key
hu2019ajournal Use this key to autocite in the manuscript while using SciMatic Manuscript Manager or Thesis Manager
Authors Hu, Shanshan;Li, Wenyuan;Li, Wei;Zhang, Nan;Qi, He;Finklea, Harry;Liu, Xingbo;
Journal Journal of colloid and interface science
Year 2019
DOI
S0021-9797(19)30877-X
URL
Keywords Keywords not found

Citations

No citations found. To add a citation, contact the admin at info@scimatic.org

No comments yet. Be the first to comment on this article.