Development of a wet oxidation process for the mass production of 940 nm vertical cavity surface emitting laser (VCSEL)

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ID: 287240
2025
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Abstract
The demand for high-performance Vertical-Cavity Surface-Emitting Lasers (VCSELs) operating at a wavelength of 940 nm has significantly increased due to their applications in optical communication, sensing, and consumer electronics. This thesis investigates the wet oxidation process as a viable method for the fabrication of VCSELs, focusing on optimizing this technique to enhance production efficiency and device performance at a mass production scale The research begins by examining the fundamental operating principles, device structure, and application domains of 940 nm VCSELs, followed by a systematic exploration of the fabrication process, emphasizing epitaxial growth and oxidation techniques crucial for current and optical confinement. A robust wet oxidation process is developed through optimization of key parameters, including temperature, oxidation time, and nitrogen flow, to achieve precise and reproducible control over oxide aperture size and depth. Post-oxidation characterization is carried out using a combination of optical microscopy (OM), infrared (IR) microscopy, and focused ion beam (FIB) analysis to assess surface quality, aperture uniformity, and cross-sectional morphology. In addition, the oxidation kinetics of high-Al-content AlₓGa₁₋ₓAs layers (x > 0.98) are analyzed to establish a quantitative relationship between aluminum composition and oxidation behavior, enabling rapid in-line feedback for process control. Finally, to ensure compatibility with mass production requirements, batch-to-batch repeatability and within-wafer uniformity are evaluated. Process control methodologies such as standardized operating procedures (SOP) and statistical process control (SPC) are implemented to maintain oxide aperture dimensions within 9.8 ± 1 μm and wafer-level uniformity below 10%, ensuring high yield and long-term process stability. This thesis contributes to the broader field of optoelectronics by providing a comprehensive understanding of the wet oxidation process, establishing guidelines for its implementation in mass production while ensuring the optimization of device performance. The findings aim to facilitate advancements in VCSEL technology and its integration into future applications. Keywords: 940 nm VCSEL, wet oxidation process, mass production
Reference Key
persistent_1760660996_68f18e04c8165 Use this key to autocite in the manuscript while using SciMatic Manuscript Manager or Thesis Manager
Authors Ma, Yu
Journal Malay Journal
Year 2025
DOI
DOI not found
URL
https://animorepository.dlsu.edu.ph/etdm_physics/24
Keywords Keywords not found

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