Gate leakage currents of AlGaN/GaN HEMT structures grown by metalorganic vapour phase epitaxy

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ID: 270898
2007
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Abstract
The gate leakage current of AlGaN/GaN HEMTs increased with increasing Al mole fraction x from 0.25 to 0.36. Donor density Nd of AlGaN layer increased to ∼ 1×1018 (cm‐3) with increasing x to 0.36. It is estimated that rather low Nd may not influence the gate leakage. AlGaN surface morphology became worse with increasing x. Reverse‐bias characteristics were well‐fitted by calculation taking into account localized regions with high conductivity. The results suggest that deteriorating imperfections with x of AlGaN layer produce large gate leakage currents. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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nanishi2007physicagate Use this key to autocite in the manuscript while using SciMatic Manuscript Manager or Thesis Manager
Authors T. Yamada,T. Tsuchiya,K. Imada,M. Iwami,J. Kikawa,T. Araki,A. Suzuki,Y. Nanishi;T. Yamada;T. Tsuchiya;K. Imada;M. Iwami;J. Kikawa;T. Araki;A. Suzuki;Y. Nanishi;
Journal physica status solidi (c)
Year 2007
DOI
10.1002/pssc.200674763
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