ITO/SiO2/ITO Structure on a Sapphire Substrate Using the Oxidation of Ultra-Thin Si Films as an Insulating Layer for One-Glass-Solution Capacitive Touch-Screen Panels
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ID: 266653
2020
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Abstract
The SiO2 generated by low-temperature oxidation of ultra-thin metallic silicon (thickness = 50 nm) film was evaluated for implementation in one-glass-solution capacitive touch-screen panels (OGS-TSPs) on sapphire-based substrates. Our results show that the silicon films oxidized at 823 K exhibited the highest visible transmittance about 91% at 550 nm, compared to ~72% transmittance of the as-deposited silicon films which were deposited at room temperature. Additionally, the annealed films exhibited a more uniform, dense, and smooth surface microstructure than that of the as-deposited Si films. X-ray photoelectron spectroscopy (XPS) results revealed that the low-temperature oxidation of Si films at 823 K yielded SiO2. Furthermore, when the insulating SiO2 film obtained by low-temperature oxidation was sandwiched between two indium tin oxide (ITO) layers (ITO/SiO2/ITO) on a sapphire substrate, the SiO2 film resulted in the dielectric strength of approximately 3 MV/cm. In addition, the highest optical transmittance obtained by the ITO/SiO2/ITO films is about 88.3%. The change in capacitance of the ITO/SiO2/ITO structure was approximately 3.2 pF, which indicates the possibility of implementation in capacitive touch-screen panel devices.
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joo2020coatingsito/sio2/ito
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| Authors | Shin Yong Joo;Chadrasekhar Loka;Young Woong Jo;Maddipatla Reddyprakash;Sung Whan Moon;YiSik Choi;Seong Eui Lee;Gue Serb Cho;Kee-Sun Lee;Joo, Shin Yong;Loka, Chadrasekhar;Jo, Young Woong;Reddyprakash, Maddipatla;Moon, Sung Whan;Choi, YiSik;Lee, Seong Eui;Cho, Gue Serb;Lee, Kee-Sun; |
| Journal | coatings |
| Year | 2020 |
| DOI |
10.3390/coatings10020134
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