Suppressing the Photocatalytic Activity of TiO2 Nanoparticles by Extremely Thin Al2O3 Films Grown by Gas-Phase Deposition at Ambient Conditions
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ID: 265809
2018
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Abstract
This work investigated the suppression of photocatalytic activity of titanium dioxide (TiO2) pigment powders by extremely thin aluminum oxide (Al2O3) films deposited via an atomic-layer-deposition-type process using trimethylaluminum (TMA) and H2O as precursors. The deposition was performed on multiple grams of TiO2 powder at room temperature and atmospheric pressure in a fluidized bed reactor, resulting in the growth of uniform and conformal Al2O3 films with thickness control at sub-nanometer level. The as-deposited Al2O3 films exhibited excellent photocatalytic suppression ability. Accordingly, an Al2O3 layer with a thickness of 1 nm could efficiently suppress the photocatalytic activities of rutile, anatase, and P25 TiO2 nanoparticles without affecting their bulk optical properties. In addition, the influence of high-temperature annealing on the properties of the Al2O3 layers was investigated, revealing the possibility of achieving porous Al2O3 layers. Our approach demonstrated a fast, efficient, and simple route to coating Al2O3 films on TiO2 pigment powders at the multigram scale, and showed great potential for large-scale production development.
| Reference Key |
guo2018nanomaterialssuppressing
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| Authors | Jing Guo;Hao Van Bui;David Valdesueiro;Shaojun Yuan;Bin Liang;J. Ruud Van Ommen;Guo, Jing;Van Bui, Hao;Valdesueiro, David;Yuan, Shaojun;Liang, Bin;Van Ommen, J. Ruud; |
| Journal | Nanomaterials |
| Year | 2018 |
| DOI |
10.3390/nano8020061
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