block copolymer nanostructures for technology
Clicks: 206
ID: 213003
2010
Article Quality & Performance Metrics
Overall Quality
Not rated
Combines reader engagement with the AI quality analysis. This
article has not been analysed, so there is no overall score —
reader engagement is measured and shown alongside.
Reader Engagement
Star Article
30.0
/100
206 views
35 readers
AI Quality Assessment
Not analyzed
Readership in this journal
StarRanked #151 of 194 articles by views in Journal of Fluorescence
Most read
Least read
Bar heights use a square-root scale. Only the 120 most-read articles are drawn; the journal has 194 in total.
Mint this article as an NFT
Not yet mintedCreate a permanent, verifiable on-chain record of this article on the Scimatic Network. The NFT is held in your Journament account, and you can withdraw it to your own wallet at any time.
5
SUSD
one-off · no wallet required
Abstract
Nanostructures generated from block copolymer self-assembly enable a variety of potential technological applications. In this article we review recent work and the current status of two major emerging applications of block copolymer (BCP) nanostructures: lithography for microelectronics and photovoltaics. We review the progress in BCP lithography in relation to the requirements of the semiconductor technology roadmap. For photovoltaic applications, we review the current status of the quest to generate ideal nanostructures using BCPs and directions for future research.
| Reference Key |
tseng2010polymersblock
Use this key to autocite in the manuscript while using
SciMatic Manuscript Manager or Thesis Manager
|
|---|---|
| Authors | ;Yu-Chih Tseng;Seth B. Darling |
| Journal | Journal of Fluorescence |
| Year | 2010 |
| DOI |
10.3390/polym2040470
|
| URL | |
| Keywords |
Citations
No citations found. To add a citation, contact the admin at info@scimatic.org
Comments
No comments yet. Be the first to comment on this article.