lithography-free, low-cost method for improving photodiode performance by etching silicon nanocones as antireflection layer
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ID: 205373
2016
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Abstract
A three-step process has been demonstrated to improve the performance of photodiode by creating nanocone forest on the surface of photodiode as an antireflection layer. This high-throughput, low-cost process has been shown to decrease the reflectivity by 66.1%, enhance the quantum efficiency by 27%, and increase the responsivity by 25.7%. This low-cost manufacture process can be applied to increase the responsivity of silicon based photonic devices.
| Reference Key |
jiang2016journallithography-free,
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|---|---|
| Authors | ;Jing Jiang;Zhida Xu;Jiahao Lin;Gang Logan Liu |
| Journal | BMC infectious diseases |
| Year | 2016 |
| DOI |
10.1155/2016/4019864
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| URL | |
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