grown low-temperature microcrystalline silicon thin film by vhf pecvd for thin films solar cell
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ID: 174634
2015
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Abstract
Hydrogenated microcrystalline silicon thin films can be used to fabricate stable thin
film solar cell, which were deposited by very high frequency plasma-enhanced
chemical vapor deposition at low temperatures (~200°C). It has been found that the
obtained film presented excellent structural and electrical properties, such as high
growth rate and good crystallinity. With the decreasing of silane concentration, the
optical gap and the dark conductivity increased, whereas the activation energy
decreased. A reasonable explanation was presented to elucidate these phenomena. In
addition, we fabricated p-i-n structure solar cells using the optimum microcrystalline
silicon thin films, and preliminary efficiency of 4.6% was obtained for 1 μm thick
microcrystalline silicon thin film solar cells with open-circuits voltage of 0.773 V and
short-circuits current density of 12.28 mA/cm2. Future scope for performance
improvement lies mainly in further increasing the short-circuit current.
| Reference Key |
peng2015journalgrown
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|---|---|
| Authors | ;Shanglong Peng;Desheng Wang;Fuhua Yang;Zhanguo Wang;Fei Ma |
| Journal | reproductive biology and endocrinology |
| Year | 2015 |
| DOI |
10.1155/2015/327596
|
| URL | |
| Keywords |
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