microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications
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ID: 145886
2016
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Abstract
In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 × 106 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical finesse up to 50000 has been observed.
| Reference Key |
serra2016aipmicrofabrication
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| Authors | ;E. Serra;M. Bawaj;A. Borrielli;G. Di Giuseppe;S. Forte;N. Kralj;N. Malossi;L. Marconi;F. Marin;F. Marino;B. Morana;R. Natali;G. Pandraud;A. Pontin;G. A. Prodi;M. Rossi;P. M. Sarro;D. Vitali;M. Bonaldi |
| Journal | journal of hydrology: x |
| Year | 2016 |
| DOI |
10.1063/1.4953805
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| URL | |
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