Microwave plasma-enhanced chemical vapour deposition growth of carbon nanostructures

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ID: 113477
2010
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Abstract
The effect of various input parameters on the production of carbon nanostructures using a simple microwave plasma-enhanced chemical vapour deposition technique has been investigated. The technique utilises a conventional microwave oven as the microwave energy source. The developed apparatus is inexpensive and easy to install and is suitable for use as a carbon nanostructure source for potential laboratory-based research of the bulk properties of carbon nanostructures. A result of this investigation is the reproducibility of specific nanostructures with the variation of input parameters, such as carbon-containing precursor and support gas flow rate. It was shown that the yield and quality of the carbon products is directly controlled by input parameters. Transmission electron microscopy and scanning electron microscopy were used to analyse the carbon products; these were found to be amorphous, nanotubes and onion-like nanostructures.
Reference Key
singh2010microwavesouth Use this key to autocite in the manuscript while using SciMatic Manuscript Manager or Thesis Manager
Authors Singh, Shivan R.;Jarvis, A.L. Leigh;
Journal south african journal of science
Year 2010
DOI
DOI not found
URL
http://archive.sajs.co.za/index.php/SAJS/article/view/183
Keywords
Education Pharmacy and materia medica Materials of engineering and construction. Mechanics of materials Information technology Technology Science (General) Science renewable energy sources environmental sciences general works nutritional diseases. deficiency diseases public aspects of medicine social sciences (general) social sciences electronic computers. computer science

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