fabricating 90 nm resolution structures in sol-gel silica optical waveguides for biosensor applications

Abstract

Bragg grating structure in a sol-gel silica waveguide is fabricated on the basis of nanoimprint lithography for biophotonic applications. The process realizes nonstandardized lithography in sol-gel silica at a high resolution for a relatively large area in the range of several micrometers with a resolution in the order of several nanometers. Here we demonstrate structures of 250 and 90 nm resolutions in a sol-gel silica optical waveguide for a large area that is not optimized to date. Bragg grating of a 250 nm periodic structure is realized for a 1 mm long area.