Influence of O2 partial pressure on the growth of nanostructured anatase phase TiO2 thin films prepared by DC reactive magnetron sputtering

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ID: 116187
2011
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Authors Susana Sério,M. E. Melo Jorge,Manuel J.P. Maneira,Yuri Nunes;Susana Sério;M. E. Melo Jorge;Manuel J.P. Maneira;Yuri Nunes;
Journal materials chemistry and physics
Year 2011
DOI 10.1016/j.matchemphys.2010.12.008
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